New Launch
Dual Stack SRD Spin Rinse Dryer
Three-way Pneumatic Diaphragm Valve
The diaphragm valve is a new type of shut-off valve, with its open-close component being a diaphragm made of soft material, which separates the valve body cavity from the valve cover cavity and the driving components. This pneumatic diaphragm valve is designed compactly and assembled in a cleanroom environment. The overall material used is PTFE, which has good resistance to highly pure and corrosive chemicals.
Features:
- Auto valve that automatically regulates On-Off using compressed air (single-acting/double-acting).
2.Suitable for semiconductors and LCD (CCSS and WET equipment), chemicals, and DI water.
- Sturdy and simple design.
- Can be used for high temperature, high pressure, acidic, and alkaline fluids.
- Fluid temperature: 0~90℃.
- Pipe size: 3/8″.
Semiconductor Parts In Stock
Used KLA-TENCOR 2214-30SLQTA Laser Head 0105128-000
SANYO DENKI P30B04010DXS8FM AMAT 0195-07983 AC Servo Motor Used
Panasonic MSMD012P1T Servo Motor 3000 RPM 200V New
SMC NP420-DN1 16-Port Pneumatic Manifold Controller As-Is
LAM 810-495659-308 PCB ESC Power Supply Board As-Is
AMAT ESC1.5PN75X3286 (0190-14140) ESC Power Supply Used
C-2030-D01 NOVELLUS TRUST AUTOMATION 2 AXIS SPINDLE CONTROLLER Used
HBO 3500 W/PIL UV SHORT ARC LAMP Used
Pittman GM9413J818-R3 Servo Motor AS-IS
TEL DAIHEN WMN-50H6 3D39-050098-14 Automatch Working Condition
LAM PCB 810-801237-001 STEPPER DRIVER INTERFACE AS-IS
ASYST ATR9100 Advantag 9100 RFID Controller PN:9701-2936-01 Used
About Semirefurb
Semiconductor Equipment Solutions
We are the professional supplier of semiconductor part for IC manufacturing industry. We have over 2300 items in stock ready to supply to our clients. We also offer repair and maintenance for critical parts and used equipments.
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Latest Posts
The difference between semiconductor deposition and etching is that they are two distinct processes in semiconductor fabrication, playing crucial roles in the manufacturing of semiconductor devices.
Epitaxial growth is a process used to grow a high-quality crystalline thin film on a substrate, typically a semiconductor material. In this process, the newly grown thin film adopts the lattice structure of the substrate crystal, resulting in a highly ordered single-crystal film.
During the MOCVD process, metal-organic precursors are introduced into the chamber as vapor, along with carrier gases and reactant gases. The chamber is heated to a specific temperature, causing the metal-organic precursors to decompose and react with the reactant gases.
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