What is Wafter Deposition and Etching The difference between semiconductor deposition and etching is that they are two distinct processes in semiconductor fabrication, playing crucial roles in the manufacturing of semiconductor devices. Below are the main differences between them: Semiconductor Deposition: Deposition is the process of forming a thin film on the surface of semiconductor […]

Epitaxial growth is a process used to grow a high-quality crystalline thin film on a substrate, typically a semiconductor material. In this process, the newly grown thin film adopts the lattice structure of the substrate crystal, resulting in a highly ordered single-crystal film. Epitaxial growth is essential for manufacturing semiconductor materials with specific properties, such

What Does Chamber Mean In Mocvd Reactor? In the context of a Metal-Organic Chemical Vapor Deposition (MOCVD) reactor, the term “chamber” refers to the enclosed space where the deposition process takes place. The MOCVD chamber is designed to maintain a controlled environment, including temperature, pressure, and gas flow, to facilitate the growth of thin films